차세대 에너지 연구소 Research Institute for Solar and sustainable Energies - 논문 > Rapid and Reliable Formation of Highly Densified Bilayer Oxide Dielectrics on Silicon Substrates via DUV Photoactivation for Low-Voltage Solution-Processed Oxide Thin-Film Transistors

    
  
  
  
  
  
  
  
  

  
  
  

  
  
  
  

  
  

  

  
  
  
  

    
  

  
  
  


  

  
  


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Rapid and Reliable Formation of Highly Densified Bilayer Oxide Dielectrics on Silicon Substrates via DUV Photoactivation for Low-Voltage Solution-Processed Oxide Thin-Film Transistors
작성일  :  2021.01.06 조회  :  2,284

Won-June Lee, Jun-Gyu Choi, Sujin Sung, Chang-Hyun Kim, Sekwon Na, Young-Chang Joo, Sungjun Park, Myung-Han Yoon


https://dx.doi.org/10.1021/acsami.0c18118


ACS Appl. Mater. Interfaces 2021, 13, 2820−2828


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